自定义博客皮肤VIP专享

*博客头图:

格式为PNG、JPG,宽度*高度大于1920*100像素,不超过2MB,主视觉建议放在右侧,请参照线上博客头图

请上传大于1920*100像素的图片!

博客底图:

图片格式为PNG、JPG,不超过1MB,可上下左右平铺至整个背景

栏目图:

图片格式为PNG、JPG,图片宽度*高度为300*38像素,不超过0.5MB

主标题颜色:

RGB颜色,例如:#AFAFAF

Hover:

RGB颜色,例如:#AFAFAF

副标题颜色:

RGB颜色,例如:#AFAFAF

自定义博客皮肤

-+
  • 博客(0)
  • 资源 (1)
  • 收藏
  • 关注

空空如也

on-wafer去嵌方法论文

Deembedding a device mounted between a pair of identical transitions requires the transition two-port parameters. These can be obtained using the through-line (TL) deembedding method requiring only through and uniform line deembedding standards. Other related deembedding methods introduce factors to scale a pair of eigenvectors to obtain the transition twoport parameters. In this paper, it is shown that these scaling factors are interdependent and provide a corrective reference plane adjustment. Moreover, the transition wave-transmission matrix can be factored into two wave-transmission matrices with one encapsulating the transition discontinuity and the other of a matched line to provide a corrective reference plane shift. This factorization permits incorporation of desired and corrective reference plane shifts, using data from a second matched line standard. With an emphasis on substrate-integrated waveguide, the proposed TL deembedding method is verified.

2018-07-08

空空如也

TA创建的收藏夹 TA关注的收藏夹

TA关注的人

提示
确定要删除当前文章?
取消 删除